產品型號: UBM Sputter
A magnetron consists of a target with magnetsarranged behind it to make a magnet ic trapfor charged particles , such as argon ions, infront of the targ et. When negative voltage issup plied to the target, argon ions are attractedto the target surface. Then atoms of the targetare knocked out with mean kinetic energythisis SPUTTER ING . Seconda ry electron s areemitted from the target surface that becometra pped by the magnetic fie lds and undergofurther ionizing coll isions sustaining the plasma.Con finement between a negatively biasedtarget and closed magnetic field produces a dense plasma.
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Specifications |
UBM 350 |
UBM 680 |
UBM 800 |
UBM 1200 |
|
Dimensions |
W100 x H350 mm |
W100 x H680 mm |
W100 x H800 mm |
W100 x H1200 mm |
|
Weight |
20.06 kg |
34.1 kg |
40.12 kg |
60.18 kg |
|
Magnetic type |
Permanent(NdFeB) |
Permanent(NdFeB) |
Permanent(NdFeB) |
Permanent(NdFeB) |
|
Uniformity |
±5% |
±5% |
±5% |
±5% |
|
Max power |
1.0kW |
1.5kW |
2.5kW |
8kW |
|
Operating Pressure |
0.5-10 mtorr |
0.5-10 mtorr |
0.5-10 mtorr |
0.5-10 mtorr |